Attwood D. Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications

Cambridge University Press, UK, 1999. – 488 p. – ISBN: 0521652146This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science.Radiation and Scattering at EUV and Soft X-Ray Wavelengths
Wave Propagation and Refractive Index at EUV and Soft X-Ray Wavelengths
Multilayer Interference Coatings
Synchrotron Radiation
Physics of Hot Dense Plasmas
Extreme Ultraviolet and Soft X-Ray Lasers
Coherence at Short Wavelengths
Soft X-Ray Microscopy With Diffractive Optics
Extreme Ultraviolet and X-Ray Lithography
Appendixes
Units and Physical Constants
Electron Binding Energies, Principal K- and L-Shell Emission Lines, and Auger Electron Energies
Atomic Scattering Factors, Atomic Absorption Coefficients, and Subshell Photoionization Cross-Sections
Mathematical and Vector Relationships
Some Integrations in K , Ω -Space
Lorentz Space–Time Transformations